Interfacial reactions and electrical properties of hafnium-based thin films in Cu/barrier/n+- junction diodes

Type

article

Resource

Microelec Eng.(77):184-192.

Date Issued

2005

Author(s)

李勝揚;林哲堂

Ou K-L; Tsai M-H; Huang H-M; Chiou S-Y; Lin C-T; Lee S-Y

Subjects

牙醫學系

期刊論文

URI

https://203.71.86.71/handle/123456789/24783

File(s)

Name

attachment.pdf

Size

65.57 KB

Format

Adobe PDF

Checksum

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