High Cu Diffusion Resistance in Ultrathin Multi-quasi-amorphous CVD-Ti/TiNx Films

Type
article
Resource
JOURNAL OF THE ELECTROCHEMICAL SOCIETY.(151):G766-G771.
Date Issued
2004
Author(s)
歐耿良
Ou KL; Chiou SY; Lin MH;
Subjects
生醫材料暨組織工程研究所
期刊論文
URI

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