一種以低活性氣體保護易降解性高分子的射出成型方法及其裝置

Type
patent
Resource
中華民國[TW91105690(2004.公告第號)]
Date Issued
2004
Author(s)
曾厚; 李勝揚; 黃玉錤; 楊建中; ;
Subjects
學科：生物化學暨細胞分子生物學科
專利
URI

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