Fabrication of High-Frequency Tantalum Nitride Thin Film Resistors by Two-Step Plasma Ion Etching

Type
conference
Resource
Keng-Liang Ou, Yvonne Yu, Chi-Chang Wu(2012).Fabrication of High-Frequency Tantalum Nitride Thin Film Resistors by Two-Step Plasma Ion Etching. 7th Asia-Pacific International Symposium on the Basics and Applications of Plasma Technology (APSPT-7).():-.
Date Issued
2012
Author(s)
Ou, Keng-Liang;Yu, Yvonne;Wu, Chi-Chang
Subjects
生醫材料暨組織工程研究所
會議論文
URI

Copyright Notice

● The digital content on this platform is part of the Taipei Medical University Institutional Repository, featuring various academic works and outputs from the institution. It offers free access to academic research and public education for non-commercial use.

● Please use the content appropriately and within legal boundaries to respect copyright owners' rights. For commercial use, please obtain prior authorization from the copyright owner. Users must not use TMUIR for any illegal purposes.

● By utilising the platform, users are deemed to have fully accepted and understood all the regulations set out in this statement, relevant laws of the Republic of China, all international internet regulations, and usage conventions.

● TMUIR is committed to protecting the interests of copyright owners. If you believe that any material on this website infringes copyright, please contact our staff at libirtmu@gmail.com, and we will remove the work from the repository.

Built with DSpace-CRIS software - Extension maintained and optimized by 4Science