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  5. 含矽類鑽碳薄膜之功能性研究
 
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含矽類鑽碳薄膜之功能性研究

Other Title
Research of functional properties on Si-doped diamond-like carbon films
Type
thesis
Date Issued
2011-06-19
Author(s)
陳紀佑
Advisor
歐耿良
Subjects
系所名稱:生醫材料暨工程研究所
Description
學位別:碩士
語文別:英文
指導教授:歐耿良
共同指導教授:
口試委員:吳其昌;劉沖明
中文關鍵字:類鑽碳;射頻磁控濺鍍
Abstract
類鑽碳是由碳的鍵結SP2鍵結與SP3鍵結混合所構成,因此於特性上同時擁有鑽石與石墨之特性,如高生物相容性、高硬度、化學惰性與低磨擦係數等,是近年來各界積極開發之薄膜材料。且目前盛行於類鑽碳薄膜材料中添加微量元素,以增加其應用之範圍,如添加抗菌性元素矽、銅、銀、鋅與鈦…等等,皆可提高其抗菌力等功能性。
本研究以射頻磁控濺鍍法進行摻矽類鑽碳薄膜之製備,藉由類鑽碳薄膜內摻入不同含量之矽元素,探討類鑽碳薄膜矽含量對其功能性之影響。由各種物化性分析儀得知,於表面形貌,在類鑽碳膜未摻雜矽元素時,表面碳元素團聚之顆粒較大,於矽元素之增加表面原子成核成長較為細緻,且隨著矽含之增加平均粗糙度、硬度與楊氏模數會隨之減少,且當ID/IG比值越高,硬度越低,水滴接觸角也越小。
URI
https://203.71.86.71/handle/123456789/13451

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