Chemical evidences for the optimal coagulant dosage and pH adjustment of silica removal from chemical mechanical polishing (CMP) wastewater

Type
article
Resource
Colloids and Surfaces A: Physicochemical and Engineering Aspects.(342):1-7.
Date Issued
2009
Author(s)
Kuan WH; Hu CY
Subjects
公共衛生學系
期刊論文
URI

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