李勝揚;林哲堂Ou K-L; Tsai M-H; Huang H-M; Chiou S-Y; Lin C-T; Lee S-Y2026-05-212026-05-212005https://203.71.86.71/handle/123456789/24783en-US牙醫學系期刊論文Interfacial reactions and electrical properties of hafnium-based thin films in Cu/barrier/n+- junction diodesarticle